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Title of Article

FABRICATION AND CERTIFICATION FOR EUV LITHOGRAPHY PROJECTION LENS AT A WAVELENGTH OF 13.5 nm


Issue
1
Date
 2014

Article type
 scientific article
UDC
681.787
Pages
178-184
Keywords
: EUV lithography lens, aspheric mirrors, interferometry


Authors
Malyshev I.V.
Institut fiziki mikrostruktur RAN, Nizhniy Novgorod; Nizhegorodskiy gosuniversitet im. N.I. Lobachevskogo

Toropov M.N.
Institut fiziki mikrostruktur RAN, Nizhniy Novgorod

Chkhalo N.I.
Institut fiziki mikrostruktur RAN, Nizhniy Novgorod


Abstract
In this paper, we discuss the modification of a lithography lens and the certification of aspheric mirrors without the wavefront correction.

File (in Russian)

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