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Title of Article

MATHEMATICAL SIMULATION OF GALVANIC METAL DEPOSITION ON POROUS ELECTROCONDUCTIVE SUBSTRATES


Issue
5
Date
2010

Article type
scientific article
UDC
621.357.77:001.57
Pages
98-101
Keywords
mathematical simulation, porous substrates, galvanic metallization


Authors
Fadeeva Ekaterina Sergeevna
Nizhegorodskiy gosudarstvennyy tekhnicheskiy universitet im. R.E. Alekseeva

Boriskova Ekaterina Mikhaylovna
Nizhegorodskiy gosudarstvennyy tekhnicheskiy universitet im. R.E. Alekseeva

Gunko Yuriy Leonidovich
Nizhegorodskiy gosudarstvennyy tekhnicheskiy universitet im. R.E. Alekseeva

Kozina Olga Leonidovna
Nizhegorodskiy gosudarstvennyy tekhnicheskiy universitet im. R.E. Alekseeva

Mikhalenko Mikhail Grigorevich
Nizhegorodskiy gosudarstvennyy tekhnicheskiy universitet im. R.E. Alekseeva


Abstract
A mathematical model of galvanic metal deposition on the porous substrate fibers has been proposed. The model allows one to define the conditions of depth-uniform deposition on the substrate and it takes into account the distribution of the current and electrolyte compound concentrations in the substrate pores. Necessary formulas for the model simulation have been presented.

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