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Title of Article

DIAGNOSTICS OF THIN SILICON-ON-SAPPHIRE LAYERS IN ELECTROLYTE/SEMICONDUCTOR SYSTEM


Issue
5
Date
2010

Article type
scientific article
UDC
621.382
Pages
313-316
Keywords
silicon on sapphire, electrolyte/semiconductor, capacity, photo-emf


Authors
Tikhov Stanislav Viktorovich
Nizhegorodskiy gosuniversitet im. N.I. Lobachevskogo

Pavlov Dmitriy Alekseevich
Nizhegorodskiy gosuniversitet im. N.I. Lobachevskogo

Shengurov Vladimir Gennadevich
Nizhegorodskiy issledovatelskiy fiziko-tekhnicheskiy institut NNGU im. N.I. Lobachevskogo

Denisov Sergey Aleksandrovich
Nizhegorodskiy issledovatelskiy fiziko-tekhnicheskiy institut NNGU im. N.I. Lobachevskogo

Chalkov Vadim Yurevich
Nizhegorodskiy issledovatelskiy fiziko-tekhnicheskiy institut NNGU im. N.I. Lobachevskogo

Shilyaev Pavel Anatolevich
Nizhegorodskiy gosuniversitet im. N.I. Lobachevskogo

Korotkov Evgeniy Viktorovich
Nizhegorodskiy gosuniversitet im. N.I. Lobachevskogo

Turkov Sergey Vasilevich
Nizhegorodskiy gosuniversitet im. N.I. Lobachevskogo


Abstract
A procedure to control thin silicon-on-sapphire layers in an electrolyte/semiconductor system has been developed. The procedure differs from the conventional one by a specific way of making an electrolyte/semiconductor contact. The application of the procedure allows one to define a number of significant layer parameters such as thickness, doping level and profile, and to determine the presence of deep defects in Si layers.

File (in Russian)