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Title of Article

CONTRIBUTION OF HYPERFINE INTERACTION TO THE PROCESSES OF SPIN RELAXATION OF CONDUCTION ELECTRONS IN SILICON


Issue
3
Date
2012

Article type
scientific article
UDC
537.9
Pages
34-36
Keywords
monoisotopic silicon, conduction electrons, electron spin resonance, spin relaxation, spin-orbit coupling, hyperfine interaction, electronic g-factor


Authors
Sukhorukov Andrey Vladimirovich
Nizhegorodskiy gosuniversitet im. N.I. Lobachevskogo

Ezhevskiy Aleksandr Aleksandrovich
Nizhegorodskiy gosuniversitet im. N.I. Lobachevskogo

Gusev Anatoliy Vladimirovich
Institut khimii vysokochistykh veschestv RAN, Nizhniy Novgorod

Guseynov Davud Vadimovich
Nizhegorodskiy gosuniversitet im. N.I. Lobachevskogo

Popkov Sergey Alekseevich
Nizhegorodskiy gosuniversitet im. N.I. Lobachevskogo


Abstract
The contribution of different mechanisms to spin relaxation processes of conduction electrons has been investigated. Particular attention is paid to the mechanism associated with the hyperfine interaction (HFI) of the conduction electrons with 29Si nuclei. The HFI contribution is found by measuring the conduction-electron spin resonance linewidth in silicon crystals with different content of 29Si nuclei followed by its comparison with the theoretical estimations made in the approximation of the Pershin-Privman model. Experimental determination of the HFI contribution is complicated by the fact that it is defined on the background of effective mechanisms of spin relaxation of conduction electrons in silicon associated with the electron spin-flip scattering on impurity and phonons.

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