FABRICATION AND CERTIFICATION FOR EUV LITHOGRAPHY PROJECTION LENS AT A WAVELENGTH OF 13.5 nm |
1 | |
2014 |
scientific article | 681.787 | ||
178-184 | : EUV lithography lens, aspheric mirrors, interferometry |
In this paper, we discuss the modification of a lithography lens and the certification of aspheric mirrors without the wavefront correction. |